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Volumn 12, Issue 4, 2002, Pages 414-419
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A 32-site neural recording probe fabricated by DRIE of SOI substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRODES;
ELECTRON BEAMS;
MICROMACHINING;
PROBES;
REACTIVE ION ETCHING;
DEEP REACTIVE ION ETCHING;
NEURAL RECORDING PROBE;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 0036645870
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/12/4/312 Document Type: Article |
Times cited : (165)
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References (16)
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