Some lithographic limits of back end lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 290-297

  McCallum, M ^a  

^a Nikon Precision Europe GmbH   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; OPTICAL INTERCONNECTS; PRINTING; TECHNOLOGICAL FORECASTING;

RESOLUTION ENHANCEMENT TECHNIQUES (RET);

PHOTOLITHOGRAPHY;

EID: 0034839434     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425217     Document Type: Conference Paper

References (6)

1. Improving resolution in photolithography with a phase-shifting mask
2. Algorithm for optimising stepper performance through image manipulation
3. PREVAIL: IBM's e-beam technology for next generation lithography
4. NGL and optical CoO update, second half 1999
5. Mask cost of ownership for advanced lithography