Microelectronics planar technologies for the manufacturing of high spatial frequency gratings: Sub-Angström assessment of spatial coherence

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 209-216

  Parriaux, O ^a   Jourlin, Y ^a   Pigeon, F ^a   Bouchet, G ^a   Van Dijk, P ^a   Pellens, R ^a   Topcu S ^b   Alayli, Y ^b   Bonis, M ^b  

^a UNIVERSITÉ JEAN MONNET   (France)

^b UNIVERSITÉ DE TECHNOLOGIE DE COMPIÈGNE   (France)

Author keywords

Aberrations; Diffractive optical elements; Displacement sensor; Gratings; Photolithography; Step and repeat camera

Indexed keywords

ABERRATIONS; CAMERAS; COHERENT LIGHT; DIFFRACTIVE OPTICS; INTERFEROMETRY; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; OPTICAL SENSORS; PHOTOLITHOGRAPHY; READOUT SYSTEMS;

PLANAR TECHNOLOGIES;

DIFFRACTION GRATINGS;

EID: 0035759997     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448042     Document Type: Article

References (6)

1. st, 2001.
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3. Yves Jourlin, "Codeur optique miniature de haute résolution pour (micro)systèmes électro-mécaniques", PhD thesis, Saint-Etienne University, France, 2000.
4. Y. Jourlin, O. Parriaux and A.V. Tishchenko, "Phase relationships of a two beam grating recombiner ", accepted by Optical Engineering, January 2001.
5. A. Spies, "Linear and angular encoders for the high-resolution range", Progress in Precision engineering and Nanotechnology, Proceeding of the 9th International Precision Engineering Seminar, Braunschweig, Germany, 26-30 May 1997.
6. O. Parriaux, H. Vuilliomenet, P. Sixt, N. Cuny, "Spatial-frequency bandwith in the photolithographic transfer of submicron gratings", Optical Engineering, 34, pp.2657-2659, 1995.