Mask characteristics for projection electron-beam lithography with demagnification imaging

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 277-283

  Kaiwu, Peng ^a   Fuan, Zhang ^a   Guijun, Wu ^a   Wenqi, Gu ^a   Xia, Sun ^b   Niankan, Kang ^c   Qirong, Pu ^b   Zejun, Ding ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c INSTITUTE OF ELECTRONICS   (China)

Author keywords

Contrast and transmission; Electron projection lithography; Mask; Monte Carlo simulation

Indexed keywords

IMAGING TECHNIQUES; INTEGRATED CIRCUIT MANUFACTURE; MASKS; MONTE CARLO METHODS; PHOTOLITHOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY;

DEMAGNIFICATION IMAGING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036643638     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00533-6     Document Type: Conference Paper

References (6)