The multi-aperture hollow target: A method for determining ion incidence angles in plasma immersion ion implantation

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 92-96

  Ensinger, W ^a   Volz, K ^a   Galonska, M ^b   Gabor, Ch ^b   Klein, H ^b  

^a PHILIPPS UNIVERSITY MARBURG   (Germany)

^b GOETHE UNIVERSITY   (Germany)

Author keywords

Ion incidence angle; Multi aperture hollow target; Three dimensional ion implantation

Indexed keywords

ELECTRIC POTENTIAL; PLASMA SHEATHS; TARGETS;

PULSE VOLTAGE;

ION IMPLANTATION;

ION IMPLANTATION;

EID: 0036641007     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00129-9     Document Type: Article

References (9)