메뉴 건너뛰기




Volumn 113, Issue 1-4, 1996, Pages 266-269

Influence of plasma density and plasma sheath dynamics on the ion implantation by plasma immersion technique

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; DIFFUSION; ION SOURCES; IONS; PLASMA DENSITY; PLASMA SHEATHS; PLASMA SOURCES; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE TREATMENT; TARGETS;

EID: 0030166689     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01414-4     Document Type: Article
Times cited : (10)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.