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Volumn 113, Issue 1-4, 1996, Pages 266-269
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Influence of plasma density and plasma sheath dynamics on the ion implantation by plasma immersion technique
a b c b a a c a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
CARBON;
DIFFUSION;
ION SOURCES;
IONS;
PLASMA DENSITY;
PLASMA SHEATHS;
PLASMA SOURCES;
PLASMAS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SURFACE TREATMENT;
TARGETS;
ARGON IONS;
IMPLANTATION DOSE;
NEGATIVE VOLTAGES;
PLASMA IMMERSION ION IMPLANTATION;
PLASMA SHEATH DYNAMICS;
ION IMPLANTATION;
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EID: 0030166689
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01414-4 Document Type: Article |
Times cited : (10)
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References (7)
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