Radiation Chemistry of Triphenylsulfonium Salts in EB and X-Ray Chemically Amplified Resists -Proton Generation Mechanisms

Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 577-580

  Nagahara, Seiji ^a   Kozawa, Takahiro ^a   Yamamoto, Yukio ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Acid generation mechanism; Eb and x ray chemically amplified resists; Ionizing radiation; Sulfonium salt

Indexed keywords

EID: 0010088762     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.577     Document Type: Article

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