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Volumn 42, Issue 6, 2002, Pages 935-941

Modeling of the I-V characteristics of high-field stressed MOS structures using a Fowler-Nordheim-type tunneling expression

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELD EFFECTS; ELECTRIC INSULATORS; ELECTRON ENERGY LEVELS; ELECTRON TUNNELING; GATES (TRANSISTOR); OXIDES; STRESSES;

EID: 0036603704     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(02)00009-4     Document Type: Article
Times cited : (11)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.