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Volumn 42, Issue 6, 2002, Pages 935-941
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Modeling of the I-V characteristics of high-field stressed MOS structures using a Fowler-Nordheim-type tunneling expression
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Author keywords
[No Author keywords available]
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Indexed keywords
CATHODES;
COMPUTER SIMULATION;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC FIELD EFFECTS;
ELECTRIC INSULATORS;
ELECTRON ENERGY LEVELS;
ELECTRON TUNNELING;
GATES (TRANSISTOR);
OXIDES;
STRESSES;
INSULATOR BARRIER;
STRESS POLARITY;
MOS DEVICES;
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EID: 0036603704
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/S0026-2714(02)00009-4 Document Type: Article |
Times cited : (11)
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References (26)
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