Coupled charge trapping dynamics in thin SiO2 gate oxide under Fowler-Nordheim stress at low electron fluence

Journal of Applied Physics

Volumn 83, Issue 5, 1998, Pages 2662-2669

  Samanta, Piyas ^a   Sarkar, C K ^b  

^a JADAVPUR UNIVERSITY   (India)

^b INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000066287     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367029     Document Type: Article

References (11)

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