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Volumn 190, Issue 1-4, 2002, Pages 792-796
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Isolated cluster ion impact on solid surfaces HOPG, Si and Cu(TiO2)/Si surfaces
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Author keywords
Cluster ion; Embossment; Hillock; Isolated ion impact
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
AUGER ELECTRON SPECTROSCOPY;
COPPER COMPOUNDS;
ELECTRIC POTENTIAL;
ION BEAMS;
ION BOMBARDMENT;
SILICON WAFERS;
SURFACE TREATMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
ISOLATED ION IMPACT;
HIGH ENERGY PHYSICS;
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EID: 0036570193
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(01)01247-2 Document Type: Conference Paper |
Times cited : (8)
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References (9)
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