Microstructures of AlGaN/AlN/Si (111) grown by metalorganic chemical vapor deposition

Physica Status Solidi (A) Applied Research

Volumn 191, Issue 1, 2002, Pages 137-142

  Xi, Dongjuan ^a   Zheng, Youdou ^a   Chen, Peng ^a   Zhao, Zuoming ^a   Chen, Ping ^a   Xie, Shiyong ^a   Shen, Bo ^a   Gu, Shulin ^a   Zhang, Rong ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; CRYSTAL GROWTH; DIFFUSION; INTERFACES (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

GROWTH TEMPERATURES;

ALUMINUM COMPOUNDS;

EID: 0036565482     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200205)191:1<137::AID-PSSA137>3.0.CO;2-R     Document Type: Conference Paper

References (16)