A coupled plasma and sheath model for high density reactors

IEEE Transactions on Plasma Science

Volumn 30, Issue 2 I, 2002, Pages 653-659

  Bose, Deepak ^b   Govindan, T R ^b   Meyyappan, M ^a,b  

^a IEEE

^b NASA AMES RESEARCH CENTER   (United States)

Author keywords

Plasma materials processing applications; Plasma sheaths; Simulation

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ELECTRIC PROPERTIES; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING; PLASMA SHEATHS;

HIGH DENSITY REACTORS; ION FLUX;

PLASMA THEORY;

EID: 0036549666     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1024264     Document Type: Article

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14. 2