Fabrication and properties of ultrasmall Si wire arrays with circuits by vapor-liquid-solid growth

Sensors and Actuators, A: Physical

Volumn 97-98, Issue , 2002, Pages 709-715

  Kawano, Takeshi ^a   Kato, Yoshiko ^a   Futagawa, Masato ^a   Takao, Hidekuni ^a   Sawada, Kazuaki ^a   Ishida, Makoto ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Micro Si probe array chip; Neural interface; Penetrating type electrode array; Smart neural activity recording sensor; Vapor liquid solid growth

Indexed keywords

CRYSTAL GROWTH; DIFFUSION; ELECTRIC CONDUCTIVITY; ELECTRIC IMPEDANCE; ELECTRODES; INTEGRATED CIRCUIT LAYOUT; INTERFACES (MATERIALS); MASKS; MOSFET DEVICES; PHOSPHORUS; PHOTOLITHOGRAPHY; SILICON WAFERS;

MICROSILICON PROBE ARRAY CHIP; NEUROELECTRONIC INTERFACE SYSTEMS; PENETRATING TYPE ELECTRODE ARRAY; PHOSPHOROUS DIFFUSION; SMART NEURAL ACTIVITY RECORDING SENSOR; VAPOR LIQUID SOLID GROWTH;

SILICON SENSORS;

EID: 0036544277     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00008-0     Document Type: Conference Paper

References (9)

1. Fabrication and properties of ultrasmall Si wire arrays by vapor-liquid-solid growth with circuits
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