Local current measurements of an insulating layer using an UHV atomic force microscope in contact mode

Journal of Magnetism and Magnetic Materials

Volumn 242-245, Issue , 2002, Pages 1261-1263

  Gilles, B ^a   Fettar, F ^a,b   Pillet, J C ^b   Marty, A ^b   Ernult, F ^b   Monso, S ^b,c   Dieny, B ^b  

^a UNIV GRENOBLE ALPES   (France)

^b CEA GRENOBLE   (France)

^c STMICROELECTRONICS   (France)

Author keywords

AFM; Tunneling

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; MAGNETORESISTANCE; OXIDATION; SILICON WAFERS; SPUTTER DEPOSITION; STOICHIOMETRY; SURFACE ROUGHNESS; TUNNEL JUNCTIONS; ULTRAHIGH VACUUM;

INSULATING LAYERS;

ELECTRIC INSULATING MATERIALS;

EID: 0036543713     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)01025-3     Document Type: Article

References (8)