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Volumn 299, Issue 302, 2002, Pages 103-107
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Influence of growth temperature on the microcrystallinity and native defect structure of hydrogenated amorphous silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CRYSTAL DEFECTS;
CRYSTAL GROWTH;
CRYSTAL STRUCTURE;
HYDROGENATION;
MICROSTRUCTURE;
THERMAL EFFECTS;
X RAY DIFFRACTION ANALYSIS;
HOT-WIRE CHEMICAL VAPOUR DEPOSITION (HW-CVD);
AMORPHOUS SILICON;
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EID: 0036539759
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3093(01)01185-1 Document Type: Article |
Times cited : (9)
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References (11)
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