Thermal analysis of multiphoton absorption at 193 nm in volume-absorbing glass

Journal of Heat Transfer

Volumn 124, Issue 2, 2002, Pages 391-393

  Zhang, Z M ^a   Chen, D H ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

Heating; Laser; Microscale; Radiation; Thermophysical

Indexed keywords

CALORIMETERS; ENERGY DISSIPATION; EXCIMER LASERS; GLASS; LASER APPLICATIONS; THERMOANALYSIS;

LASER INTENSITY PROPAGATION;

ENERGY ABSORPTION;

ABSORPTION; GLASS; HEATING; RADIATION; THERMAL ANALYSIS;

EID: 0036537318     PISSN: 00221481     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.1447940     Document Type: Article

References (10)

1. Deep ultraviolet laser metrology for semiconductor photolithography
2. Thermal analysis of the volume absorber in pulsed excimer laser calorimeters
3. Two-photon absorption at 248 nm in ultraviolet window materials
4. Efficient laser heating of transparent liquids using multiphoton absorption
5. Intensity-dependent transmission properties of window materials at 193-nm irradiation
6. Dependence of the nonlinear transmission properties of fused silica fibers on excimer laser wavelength
7. Densification of synthetic fused silica under ultraviolet irradiation
8. Characterization of absorption and scatter losses on optical components for ArF excimer lasers
9. Two-photon absorption and photoconductivity in photosensitive glasses
10. Nanosecond-to-femtosecond laser-induced breakdown in dielectrics