Growth and interfacial studies of conjugated oligomer films on Si and SiO 2 substrates

Journal of Applied Physics

Volumn 91, Issue 7, 2002, Pages 4213-4219

  Papaefthimiou, V ^a,b   Siokou, A ^b   Kennou, S ^a,b  

^a UNIVERSITY OF PATRAS   (Greece)

^b INSTITUTE OF CHEMICAL ENGINEERING SCIENCES   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

BANDBENDING; CHARACTERISTIC PEAKS; CONJUGATED OLIGOMER; DEPLETION REGION; ELECTRIC DIPOLE; GROWTH OF FILMS; HIGH PURITY; INTERFACIAL STUDY; LAYER-WISE; N-DOPED; ORGANIC FILMS; POLY-P-PHENYLENEVINYLENE; RECONSTRUCTED SURFACES; SI (1 1 1); SI(1 0 0); THREE COMPONENT; TWO-MATERIALS; ULTRAHIGH VACUUM CONDITIONS;

BINDING ENERGY; ELECTRONIC STRUCTURE; FILM GROWTH; FUNCTIONAL GROUPS; OLIGOMERS; ORGANIC LIGHT EMITTING DIODES (OLED); PHOTOELECTRONS; SILICON; SILICON WAFERS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 0036536194     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1456251     Document Type: Article

References (24)

1. M. T. Bernius, M. Inbasekaran, J. O'Brien, and W. Wu, Adv. Mater. 12, 1737 (2000). amt ADVMEW 0935-9648
2. H. E. Katz and Z. Bao, J. Phys. Chem. B 104, 671 (2000). bfk JPCBFK 1089-5647
3. W. R. Salaneck, S. Stafstrom, and J.-L. Bredas, Conjugated Polymer Surfaces and Interfaces (Cambridge University Press, Cambridge, 1996).
4. H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mater. 11, 605 (1999). amt ADVMEW 0935-9648
5. R. Schlaf, C. D. Merritt, L. A. Crisafulli, and Z. H. Kafafi, J. Appl. Phys. 86, 5678 (1999). jap JAPIAU 0021-8979
6. R. Schlaf, P. G. Schroeder, M. W. Nelson, B. A. Parkinson, C. D. Merritt, L. A. Crisafulli, H. Murata, and Z. H. Kafafi, Surf. Sci. 450, 142 (2000). sus SUSCAS 0039-6028
7. I. G. Hill, J. Schwartz, and A. Kahn, Org. Electron. 1, 5 (2000).
8. Y. Park, V.-E. Choong, B. R. Hsieh, C. W. Tang, T. Wehrmeister, K. Mullen, and Y. Gao, J. Vac. Sci. Technol. A 15, 2574 (1997). jva JVTAD6 0734-2101
9. S. C. Veenstra, U. Stalmach, V. V. Krasnikov, G. Hadziioannou, H. T. Jonkman, A. Heeres, and G. A. Sawatzky, Appl. Phys. Lett. 76, 2253 (2000). apl APPLAB 0003-6951
10. A. Siokou, V. Papaefthimiou, and S. Kennou, Surf. Sci. 482-485, 1186 (2001). sus SUSCAS 0039-6028
11. R. Schlaf, P. G. Schroeder, M. W. Nelson, B. A. Parkinson, P. A. Lee, K. W. Nebesny, and N. R. Armstrong, J. Appl. Phys. 86, 1499 (1999). jap JAPIAU 0021-8979
12. P. G. Schroeder, M. W. Nelson, B. A. Parkinson, and R. Schlaf, Surf. Sci. 459, 349 (2000). sus SUSCAS 0039-6028
13. G. Hadziioannou and P. F. Van Hutten, Semiconducting Polymers (Wiley, New York, 2000).
14. A. Ishizaka, K. Nakagawa, and Y. Shiraki, in Proceedings of the Second International Symposium MBE-CST 2, 183 (1985).
15. R. E. Gill, A. Meetsma, and G. Hadziioannou, Adv. Mater. 8, 212 (1996). amt ADVMEW 0935-9648
16. D. Briggs and M. P. Seah, Practical Surface Analysis, 2nd ed. (Wiley, New York, 1996).
17. D. Briggs, Surface Analysis of Polymers by XPS and Static SIMS (Cambridge University Press, Cambridge, 1998).
18. P. Martensson, W.-X. Ni, and G. V. Hansson, Phys. Rev. B 36, 5974 (1987). prb PRBMDO 0163-1829
19. M. Logdlund, W. R. Salaneck, F. Meyers, J. L. Bredas, G. A. Arbuckle, R. Friend, A. B. Holmes, and G. Froyer, Macromolecules 26, 3815 (1993). mml MAMOBX 0024-9297
20. M. Logdlund and W. R. Salaneck, Surf. Sci. Spectra 3, 384 (1997). sse SSSPEN 1055-5269
21. R. J. Hamers, K. M. Tromp, and J. E. Demuth, Phys. Rev. Lett. 56, 1972 (1986). prl PRLTAO 0031-9007
22. S. M. Sze, Semiconductor Devices: Physics and Technology, 3rd ed. (Wiley, New York, 1985).
23. R. Schlaf, R. Hinogami, M. Fujitani, S. Yae, and Y. Nakato, J. Vac. Sci. Technol. A 17, 164 (1999). jva JVTAD6 0734-2101
24. H. Luth, Surfaces and Interfaces of Solid Materials, 3rd ed. (Springer, Berlin, 1992).