메뉴 건너뛰기




Volumn 46, Issue 4, 2002, Pages 501-504

Release of multi-layer metal structure in MEMS devices by dry etching technique

Author keywords

MEMS devices; Micromirror; Photoresist; Plasma etching

Indexed keywords

ASPECT RATIO; DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MICROSTRUCTURE; MULTILAYERS; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING;

EID: 0036533130     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00301-X     Document Type: Article
Times cited : (9)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.