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Volumn 46, Issue 4, 2002, Pages 501-504
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Release of multi-layer metal structure in MEMS devices by dry etching technique
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Author keywords
MEMS devices; Micromirror; Photoresist; Plasma etching
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Indexed keywords
ASPECT RATIO;
DRY ETCHING;
INTEGRATED CIRCUIT MANUFACTURE;
MICROSTRUCTURE;
MULTILAYERS;
PHOTORESISTS;
PLASMA ETCHING;
REACTIVE ION ETCHING;
METALLIC MICROSTRUCTURE;
MICROELECTROMECHANICAL DEVICES;
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EID: 0036533130
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/S0038-1101(01)00301-X Document Type: Article |
Times cited : (9)
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References (8)
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