Release of multi-layer metal structure in MEMS devices by dry etching technique

Solid-State Electronics

Volumn 46, Issue 4, 2002, Pages 501-504

  Das, N C ^a,b  

^a RAYTHEON COMPANY   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

MEMS devices; Micromirror; Photoresist; Plasma etching

Indexed keywords

ASPECT RATIO; DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MICROSTRUCTURE; MULTILAYERS; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING;

METALLIC MICROSTRUCTURE;

MICROELECTROMECHANICAL DEVICES;

EID: 0036533130     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00301-X     Document Type: Article

References (8)

1. Deformable mirror spatial light modulator