Characterization of high resolution resists and metal shims by scanning probe microscopy

Microscopy and Microanalysis

Volumn 6, Issue 2, 2000, Pages 129-136

  Sexton, B A ^a   Marnock, R J ^a  

^a CSIRO   (Australia)

Author keywords

Lithography; Micromanufacturing; Nickel electroforming; Replication; Scanning probe microscopy; Shim

Indexed keywords

EID: 0006490467     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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6. Powell RA, Rossnagel SM (eds) (1999) PVD for microelectronics: sputter deposition applied to semiconductor manufacturing. Thin Films, Vol 26. Boston: Academic Press.
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