Enhancement of resist resolution and sensitivity via applied electric field

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3318-3322

  Cheng, Mosong ^a   Croffie, Ebo ^a   Yuan, Lei ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN LIQUIDS; ELECTRIC FIELD EFFECTS; MATHEMATICAL MODELS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS;

ELECTRIC FIELD ENHANCED POSTEXPOSURE BAKE (EFE PEB);

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034316434     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1324646     Document Type: Article

References (5)

1. B. Mortini et al., J. Vac. Sci. Technol. B 15, 2534 (1997).
2. M. Cheng et al., Proc. SPIE 3678 (1999).
3. M. Zuniga et al., Proc. SPIE 2724 (1996).
4. C. W. Lo et al., J. Vac. Sci. Technol. B 13, 812 (1995).
5. J. Crank et al., Diffusion in Polymers (Academic, London, 1987).