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Volumn 71, Issue 4, 2002, Pages 459-464
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Effect of hydrogen on stability of amorphous silicon thin films
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Author keywords
Amorphous silicon; Hydrogen; Metastability
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Indexed keywords
AMORPHOUS FILMS;
ANNEALING;
BORON;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL DEFECTS;
HYDROGEN;
HYDROGENATION;
ION IMPLANTATION;
PHOSPHORUS;
PRESSURE EFFECTS;
QUENCHING;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
ISOTHERMAL RELAXATION;
SEMICONDUCTING FILMS;
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EID: 0036497713
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(01)00100-3 Document Type: Article |
Times cited : (4)
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References (3)
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