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Volumn 71, Issue 4, 2002, Pages 459-464

Effect of hydrogen on stability of amorphous silicon thin films

Author keywords

Amorphous silicon; Hydrogen; Metastability

Indexed keywords

AMORPHOUS FILMS; ANNEALING; BORON; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; HYDROGEN; HYDROGENATION; ION IMPLANTATION; PHOSPHORUS; PRESSURE EFFECTS; QUENCHING; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

EID: 0036497713     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(01)00100-3     Document Type: Article
Times cited : (4)

References (3)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.