Thermal effects on the growth by metal organic chemical vapour deposition of TiO2 thin films on (100) GaAs substrates

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 36-41

  Brevet, A ^a   Fabreguette, F ^a   Imhoff, L ^a   Marco de Lucas, M C ^a   Heintz, O ^a   Saviot, L ^b   Sacilotti, M ^a   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b UNIVERSITÉ LYON 1   (France)

Author keywords

GaAs; Metal organic chemical vapour deposition; Thermal effects; Thin films; TiO2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DEPOSITION TEMPERATURE;

TITANIUM OXIDES;

CHEMICAL VAPOR DEPOSITION; FILM; GALLIUM ARSENIDE; TITANIUM DIOXIDE;

EID: 0036496757     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01586-9     Document Type: Article

References (19)