Electron diffraction and high-resolution transmission microscopy studies of nanostructured Si thin films deposited by radiofrequency dusty plasmas

Thin Solid Films

Volumn 403-404, Issue , 2002, Pages 467-470

  Viera, G ^a   Huet, S ^a   Mikikian, M ^a   Boufendi, L ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

Electron microscopy; Fcc; Nanostructured; Polymorphous silicon; RF plasma CVD

Indexed keywords

AMORPHOUS FILMS; ARGON; CRYSTAL ATOMIC STRUCTURE; ELECTRON DIFFRACTION; FILM GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

RADIOFREQUENCY (RF) DUSTY PLASMAS;

THIN FILMS;

EID: 0036468026     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01663-7     Document Type: Conference Paper

References (10)