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Materials Research Bulletin

Volumn 37, Issue 2, 2002, Pages 279-289

Determination of crystallization as a function of Mo layer thickness in Mo/Si multilayers

(5) Abdali, Salim a Gerward, Leif a Yakshin, Andrey E b Louis, Eric b Bijkerk, Fred b

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN (Netherlands)

Author keywords

A. Interfaces; A. Multilayers; A. Nanostructures; A. Surfaces; A. Thin films; C. X ray diffraction

Indexed keywords

CRYSTALLIZATION; DEPOSITION; ELECTRON BEAMS; INTERFACES (MATERIALS); MOLYBDENUM; NANOSTRUCTURED MATERIALS; SILICON; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELECTRON BEAM EVAPORATION;

MULTILAYERS;

EID: 0036466166 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/S0025-5408(01)00764-4 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.