Reflectivity of Mo/Si multilayer systems for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 844-845

  Louis, E ^a   Yakshin, A E ^a   Gorts, P C ^a   Abdali, S ^a   Maas, E L G ^a   Stuik, R ^a   Bijkerk, F ^a   Schmitz, D ^a   Scholze, F ^a   Ulm, G ^a   Haidl, M ^a   Zeiss, Carl ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; LIGHT REFLECTION; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); GRAZING-INCIDENCE REFLECTIVITY; NORMAL-INCIDENCE REFLECTIVITY;

PHOTOLITHOGRAPHY;

EID: 0032647628     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)