CAR dry etching technology to produce 0.13 um reticle

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 323-331

  Chou, Wei Zen ^a,b   Tsai, Fei Gwo ^a,b   Tuo, C C ^a,b   Yoo, C S ^a,b   Tsai, T S ^a,b   Shue, Lawrence ^a,b  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MASKS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SPUTTERING;

PLASMA DURABILITY;

DRY ETCHING;

EID: 0036457034     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476951     Document Type: Conference Paper

References (5)

1. Suyo Asai, Yasuhiro Kadowaki, Katsuhiro Kawasaki, Kazui Mizuno, Hidetoshi Satoh, Morihisa Hoga, Kazunori Ikeda, Eri Iguchi, "Advantage in using the combination of HL-800M and CAR process", SPIE vol.3748, pp. 93-100, 1999.
2. Il-Ho Lee, Kyung-Han Nam, Kyeong-Mee Yeon, Keun-Taek Park, Sang-Sool Koo, Young-Mo Koo, Ki-Ho Baik, "Implementation of Chemically Amplified Resist on Mask Technology below 0.6um Feature using High Acceleration Voltage E-beam System", SPIE vol.3748, pp. 53-61, 1999.
3. Jürgen Hochmuth, Günther Ruhl, Tom Coleman, "Control methodology of off-target for varying pattern densities with chrome dry etch", SPIE vol.3873, pp. 297-306, 1999.
4. F. Che, W. Tsai, S. Chegwidden, S. Yu, M. Kamna, J. Farnsworth, "Impact of loading effect on CD control in plasma etching of Cr photomasks using ZEP7000 resist", SPIE vol.3546, pp. 429-436, 1998.
5. Takayuki Iwamatsu, Tatsuya Fujisawa, Koji Hiruta, Hiroaki Morimoto, "Evaluation of loading effect of NLD dry etching", SPIE vol.4066, pp. 235-242, 2000.