Evaluation of loading effect of NLD dry etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 235-242

  Iwamatsu, Takayuki ^a   Fujisawa, Tatsuya ^a   Hiruta, Koji ^a   Morimoto, Hiroaki ^a  

^a NeTech Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DRY ETCHING; ELECTRIC COILS; INTEGRATED CIRCUIT MANUFACTURE; MAGNETIC MATERIALS; PHOTORESISTS; PLASMA DENSITY; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY;

CHROME DRY ETCHING; CRITICAL DIMENSION UNIFORMITY; LOADING EFFECT; LOW GAS PRESSURE; NEUTRAL LOOP DISCHARGE DRY ETCHING;

MASKS;

EID: 0033666701     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)