Detection of half-tone PSM pinhole with DUV reflected light source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 534-541

  Fujiwara, Takeshi ^a   Inoue, Hiromu ^a   Okuda, Kentaro ^a   Nomura, Takehiko ^a   Tabata, Mitsuo ^a   Endo, Satoshi ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba Machine Co Ltd   (Japan)

Author keywords

Defect; Inspection; Phase shift mask; Photolithography mask; Reflected light source

Indexed keywords

ALGORITHMS; LIGHT REFLECTION; LIGHT SOURCES; LIGHT TRANSMISSION; PHASE SHIFT; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS;

PHASE SHIFT MASKS (PSM);

MASKS;

EID: 0036454685     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476962     Document Type: Conference Paper

References (2)

1. th Annual BACUS Symposium on Photomask Technology Monterey, California September 1999 SPIE Vol.3837 pp138-146.
2. K. Oohashi, H. Inoue, T. Nomura, A. Ono, M. Tabata, H. Suzuki: "Newly developed mask inspection system with DUV laser illumination", In Photomask and Next-Generation Lithography Mask Technology VII, Hiroaki Morimoto Editor, Proceeding of SPIE Vol.4066(2000) pp452-461.