High resolution DUV inspection system for 150nm generation masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 138-146

  Tabata, Mitsuo ^a   Tsuchiya, Hideo ^a   Sanada, Yasushi ^a   Nishizaka, Takeshi ^a   Hirazawa, Hiroaki ^a   Kobayashi, Noboru ^a   Nagai, Hideo ^a   Watanabe, Tomohide ^a   Oohashi, Katsuki ^a   Inoue, Hiromu ^a   Nomura, Takehiko ^a   Ono, Akira ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; INSPECTION; OPTICAL SYSTEMS; OPTICS; PHASE SHIFT; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET INSPECTION SYSTEM; PHASE SHIFT MASKS;

MASKS;

EID: 0033318444     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373309     Document Type: Conference Paper

References (3)