Newly developed mask inspection system with DUV laser illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 452-461

  Oohashi, Katsuki ^a   Inoue, Hiromu ^a   Nomura, Takehiko ^a   Ono, Akira ^a   Tabata, Mitsuo ^a   Suzuki, Hitoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; LASER APPLICATIONS; LIGHTING; OPTICAL SYSTEMS; PATTERN RECOGNITION; SEMICONDUCTOR DEVICES; SENSORS; SPURIOUS SIGNAL NOISE;

MASK INSPECTION SYSTEM; PHASE PLATE; PHASE SHIFT MASK; SPECKLE NOISE; SPECKLE PATTERN; TIME DELAY INTEGRATION SENSOR;

MASKS;

EID: 0033665724     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392086     Document Type: Conference Paper

References (3)