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Volumn 717, Issue , 2002, Pages 95-100
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Silicon self-interstitial cluster formation and dissolution in SOI
a a a a a a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CMOS INTEGRATED CIRCUITS;
CRYSTAL DEFECTS;
SEMICONDUCTOR JUNCTIONS;
SILICON WAFERS;
TRANSMISSION ELECTRON MICROSCOPY;
CLUSTER FORMATION;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 0036449852
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-717-c2.5 Document Type: Conference Paper |
Times cited : (3)
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References (13)
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