Characterization of ZnO/DLC/Si SAW devices using FCVA-produced DLC films

Proceedings of the Annual IEEE International Frequency Control Symposium

Volumn , Issue , 2002, Pages 70-73

  Lee, M H ^a   Chang, S M ^a   Park, C K ^a   Lee, J B ^a   Park, J S ^a  

^a Hanyang University   (South Korea)

Author keywords

DLC; FCVA deposition; Frequency response; Piezoelectric ZnO; SAW device; sp3 fraction

Indexed keywords

ELECTRON MICROSCOPY; FREQUENCY RESPONSE; MULTILAYERS; PIEZOELECTRIC MATERIALS; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

ELECTROMECHANICAL COUPLINGS;

ACOUSTIC SURFACE WAVE DEVICES;

EID: 0036439976     PISSN: 01616404     EISSN: None     Source Type: Journal    
DOI: 10.1109/FREQ.2002.1075859     Document Type: Article

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