Thin films deposition in RF generated plasma by reactive pulsed laser ablation

Applied Surface Science

Volumn 197-198, Issue , 2002, Pages 338-342

  Giardini, A ^a   Marotta, V ^a   Morone, A ^a   Orlando, S ^a   Parisi, G P ^a  

^a CNR   (Italy)

Author keywords

Oxides; Reactive pulsed laser deposition; RF plasma; Thin films

Indexed keywords

ADHESION; NEODYMIUM LASERS; PLASMA APPLICATIONS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; SURFACE ROUGHNESS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

RADIO FREQUENCY (RF) PLASMAS;

THIN FILMS;

EID: 0036435784     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00395-1     Document Type: Conference Paper

References (13)

1. Fang G.J., Liu Z.L., Sun G.C., Yao K.L. Phys. Stat. Sol. (a) 184 2001 129.
2. Cantalini C., Sun H.T., Faccio M., Pelino M. Sens. Actuators B 31 1996 81.
3. Green M., Hussain Z. J. Appl. Phys. 69 1991 7788.
4. Xu Z., Vetelino J.F., Lec R., Parker D.C. J. Vac. Sci. Technol. A 8 1990 3634.
5. Haro-Poniatowski E., Jouanne M., Morhange J.F. Appl. Surf. Sci. 127-129 1998 674.
6. Gordon R.G., Barry S., Burton J.T., Broomhall-Dillard R.N.R. Thin Solid Films 392 2001 231.
7. Reed T.B., Banus M.D., Sjostrand M., Keeson P.H. J. Appl. Phys. 43 1972 2478.
8. Rao K.N., Murthy M.A., Mohan S. Thin Solid Films 176 1989 181.
9. Meng L.-J., dos Santos M.P. Thin Solid Films 226 1993 22.
10. Shibata A. Jpn. J. Appl. Phys. 30 1991 L650.
11. Takahashi Y., Matsuoka Y. J. Mater. Sci. 23 1988 2259.
12. Imai F., Kunimori K., Manabe T., Kumagai T., Nozoye H. Thin Solid Films 310 1997 184.
13. Hu W.S., Liu Z.G., Sun J., Zhu S.N., Xu Q.Q., Feng D., Ji Z.M. J. Phys. Chem. Solids 58 1997 857.