Progress of Nikon's F2 exposure tool development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 594-601

  Shiraishi, Naomasa ^a   Owa, Soichi ^a   Omura, Yasuhiro ^a   Aoki, Takashi ^a   Matsumoto, Yukako ^a   Nishikawa, Jin ^a   Tanaka, Issei ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

AR coatings; F2 lithography; Gas purging; Intrinsic birefringence; Projection optics

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; EXPOSURE CONTROLS; IMAGING TECHNIQUES; OPTICAL DESIGN; PROJECTION SYSTEMS; PURGING;

EXPOSURE TOOLS;

BIREFRINGENCE;

EID: 0036415957     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474607     Document Type: Conference Paper

References (14)

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