Current status of Nikon's F2 exposure tool development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 81-88

  Shiraishi, Naomasa ^a   Owa, Soichi ^a   Omura, Yasuhiro ^a   Aoki, Takashi ^a   Matsumoto, Yukako ^a   Hatasawa, Masato ^a   Mori, Takashi ^a   Tanaka, Issei ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

AR coatings; F2 lithography; Gas purging; Projection optics

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; IMAGE ANALYSIS; LIGHTING; MASKS; OPTICAL INSTRUMENT LENSES; OXYGEN; PHASE SHIFT; PROJECTION SYSTEMS; VLSI CIRCUITS;

GAS PURGING;

PHOTOLITHOGRAPHY;

EID: 0035758313     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435631     Document Type: Conference Paper

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