Measurement of the flare and in-field line width variation due to the flare

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1465-1473

  Jeong, Tae Moon ^a   Choi, Sung Woon ^a   Woo, Sang Gyun ^a   Han, Woo Sung ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Flare; In field uniformity; Line width variation; Modified Aerial image; Photomask

Indexed keywords

AERIAL PHOTOGRAPHY; LIGHT SCATTERING; LITHOGRAPHY; OPTICAL DEVICES; REFRACTIVE INDEX;

LINE WIDTH VARIATION;

MASKS;

EID: 0036414480     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474531     Document Type: Conference Paper

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