0.33 k1 ArF lithography for 100 nm DRAM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 810-821

  Bok, Cheolkvu ^a   Kim, Seok Kyun ^a   Kim, Hee Bom ^a   Oh, Jin Sung ^a   Ahn, Chang Nam ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL RESISTANCE; COMPUTER SIMULATION; ETCHING; MASKS; SCANNING;

CROSSPOLE ILLUMINATION;

PHOTOLITHOGRAPHY;

EID: 0036414024     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474631     Document Type: Conference Paper

References (2)

1. Chang-Nam Ahn, Hee-Bom Kim et al., "A Novel Approximate Model for Resist Process", SPIE Vol.3334(1998), p752.
2. Seo-Min Kim, Sang-Jin Kim et al., "Optimization of Dipole Off-Axis Illum/nation by 1'st Order Efficiency Method for Sub-120nm Node with KrF Lithography", Jpn. J. Appl. Phys. Vol.39(2000), p6777, Part1, No. 12B, December 2000.