Accuracy of new analytical models for resist formation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1254-1265

  Malov, J ^a   Kalus, C K ^a   Mullerke H ^a   Schmoller T ^a   Wildfeuer, R ^a  

^a Sigma C GmbH   (Germany)

Author keywords

Level set method; Lumped parameters; Optical lithography; Resist profile

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFUSION; IMAGE ANALYSIS; LIGHT PROPAGATION;

RESIST IMAGES;

PHOTORESISTS;

EID: 0036411658     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474506     Document Type: Article

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