Effect of feature size, pitch and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1054-1061

  Singh, Navab ^a   Mukherjee Roy, Moitreyee ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Coherency; Defocus; Minima Maxima; Phase shift mask; Pitch; Side lobes

Indexed keywords

ATTENUATION; COMPUTER SIMULATION; LITHOGRAPHY; PHASE SHIFT;

PHASE SHIFT MASKS;

MASKS;

EID: 0036411558     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474484     Document Type: Conference Paper

References (8)

1. Chee-Kiong Koo et al., "Application of Attenuated Phase -Shifting Masks to Sub-130 nm Lithography" Optical Microlithography XIV, SPIE vol. 4346-78.
2. Alfred Kwok-Kit Wong, "Resolution Enhancement Techniques in Optical Lithography" A publication of SPIE, pages 71-90, chapter 3. USA 2001.
3. Vinod K. Malhotra, Fang-Cheng Chang, "Verifying the Correctness of Your Optical Proximity Designs" Optical Microlithography II, SPIE vol. 3679 (1999).
4. Andrew B. Kahng and Y.C. Pari, "Sub Wavelength Lithography and its Potential Impact on Design and EDA".
5. David Gottlieb & Chi-Wang Shu, "On the Gibbs Phenomenon and its Resolution" SlAM Rev. Vol 39, No. 4 PP 644-688, Dec 1997.
6. Chris A. Mack," Using the normalized image log-slop" Microlithography world Fab 2001, May 2001, Aug 2001.
7. Chris A. Mack "Corner Rounding and Line-end Shortening in Optical Lithography" Microlithographic Techniques in Integrated Circuit Fabrication II, SPIE vol. 4226 (2000).
8. Joseph W. Goodman, "Introduction to Fourier Optics" McGraw-Hill International Editions, Second Edition 1996, page 132, chapter 6.