Wafer edge-shot algorithm for wafer scanners

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 790-801

  Hagiwara, Tsuneyuki ^a   Hamatani, Masato ^a   Tashiro, Hideyuki ^a   Morita, Etsuya ^a,b   Okita, Shinichi ^a   Kondo, Naoto ^a  

^a NIKON CORPORATION   (Japan)

^b NIKON PRECISION INC   (United States)

Author keywords

DOF; Scanning exposure; Wafer edge shot

Indexed keywords

ALGORITHMS; LENSES; OPTICAL SENSORS; SCANNING;

WAFER SCANNERS;

PHOTOLITHOGRAPHY;

EID: 0036410133     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474628     Document Type: Article

References (3)

1. I. Grodnensky, et al., "Technique for optical characterization of exposure tool imaging performance down to 100 nm," Journal of Vacuum Science & Technology B, 17(6), p. 3285-3290, 1999.
2. I. Grodnensky, et al., "Method for forming a critical dimension test structure and its use," U.S. Patent #6094256, 25 July 2000.
3. T. Hagiwara, H. Mizutani, S. Okita, N. Kondo "A method to predict CD variation caused by dynamic scanning focus errors," Optical/Laser Microlithography, SPIE Vol. 1346, part one, p. 408, 2001.