AFM analysis of gas cluster ion impact craters and smoothing

Microscopy and Microanalysis

Volumn 8, Issue SUPPL. 2, 2002, Pages 1138-1139

  Santeufemio, Christopher ^a  

^a Epion Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036409260     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/s143192760210376x     Document Type: Conference Paper

References (4)

1. Yamada et al, Materials Processing by Gas Cluster Ion Beams, Materials Science and Engineering Reports, Vol. R34, No.6 (2001) 231.
2. L.P. Allen et al., "Substrate Smoothing Using Gas Cluster Ion Beam Processing", Journal of Electronic Materials, Vol. 30, No.7 (2001) 829.
3. D.B. Fenner et al., "Ion Beam Nano-Smoothing of Sapphire and Silicon Carbide Surfaces" Proceedings of SPIE, Vol. 4468 (2001) 17.
4. Special thanks to Dr. David Fenner and to Dr. Lisa Allen for invaluable discussion.