SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 102, Issue 1-2, 1998, Pages 73-80

Tin dioxide based transparent semiconducting films deposited by the dip-coating technique

(3) Ray, Sekhar C a Karanjai, Malay K a DasGupta, Dhruba a

a UNIVERSITY OF NORTH BENGAL (India)

Author keywords

Dip coating technique; SnO2 based thin films; Transparent semiconducting oxide

Indexed keywords

COATING TECHNIQUES; COMPOSITION EFFECTS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FLUORINE; HEAT TREATMENT; HYDROLYSIS; LIGHT TRANSMISSION; PHASE COMPOSITION; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR DOPING; TRANSPARENCY;

DIP COATING; STANNOUS CHLORIDE; TIN DIOXIDE;

SEMICONDUCTING FILMS;

EID: 0032046357 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00561-6 Document Type: Article

Times cited : (74)

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