Progress towards a general grating patterning technology using phase-locked scanning beams

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4485, Issue , 2002, Pages 378-384

  Schattenburg, M L ^a   Chen, C G ^a   Heilmann, R K ^a   Konkola, P T ^a   Pati, G S ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Diffraction gratings; Holographic lithography; Interference lithography; Periodic patterns

Indexed keywords

COHERENT LIGHT; DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; HOLOGRAPHY; INTEGRATED OPTOELECTRONICS; INTERFEROMETERS; OPTICAL WAVEGUIDES;

DIAMOND RULING; LASER BEAM LITHOGRAPHY; OPTICAL FABRICATION; PHASE DISTORTIONS; PHASE ERRORS; SCANNING-BEAM INTERFERENCE LITHOGRAPHY;

DIFFRACTION GRATINGS;

EID: 0036394859     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.454273     Document Type: Conference Paper

References (8)

1. E.H. Anderson, H.I. Smith, and M.L. Schattenburg "Holographic lithography," U.S. Patent No. 5,142,385 (August 25, 1992).
2. J. Ferrera, M.L. Schattenburg, and H.I. Smith "Analysis of distortion in interferometric lithography," J. Vac. Sci. Technol. B 14, 4009-4013 (1996).
3. M.L. Schattenburg, C. Chen, P.N. Everette, J. Ferrera, P. Konkola, and H.I. Smith "Sub-100 nm metrology using interferometrically produced fiducials," J. Vac. Sci. Technol. B 17, 2692-2697 (1999).
4. C.G. Chen, P.T. Konkola, J. Ferrera, R.K. Heilmann, and M.L. Schattenburg "Analysis of vector Gaussian beam propagation and the validity of paraxial and spherical approximations," Journal of the Optical Society of America A (in press).
5. C.G. Chen, P.T. Konkola, R.K. Heilmann, G.S. Pati and M.L. Schattenburg "Image metrology and system controls for scanning beam interference lithography," J. Vac. Sci. Technol. B (submitted).
6. R.K. Heilmann, C.G. Chen, P.T. Konkola, G.S. Pati, and M.L. Schattenburg "Digital heterodyne interference fringe control system," J. Vac. Sci. Technol. B (submitted).
7. P. Konkola, C.G. Chen, R. Heilmann, and M.L. Schattenburg "Beam steering system and spatial filtering applied to interference lithography," J. Vac. Sci. Technol. B 18, 3282-3286 (2000).
8. R.K. Heilmann, P.T. Konkola, C.G. Chen, and M.L. Schattenburg "Relativistic corrections in displacement measuring interferometry," J. Vac. Sci. Technol. B 18, 3277-3281 (2000).