Effects of bombarded ion mass on electrical resistivity and wettability of carbon films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 127-128, Issue , 1997, Pages 208-211

  Iwaki, Masaya ^a   Suzuki, Yoshiaki ^a   Nakao, Aiko ^a   Watanabe, Hiroshi ^b  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b GAKUSHUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; CURRENT DENSITY; ELECTRIC CONDUCTIVITY MEASUREMENT; FILM PREPARATION; GLASS; HELIUM; KRYPTON; NEON; RAMAN SPECTROSCOPY; THIN FILMS; VACUUM DEPOSITED COATINGS;

CARBON THIN FILMS; ELECTRON BEAM EVAPORATION; FOUR POINT PROBE METHOD; LASER RAMAN SPECTROSCOPY; WETTABILITY;

ION BOMBARDMENT;

EID: 0031547698     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00887-7     Document Type: Article

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