High accuracy laser mask repair technology using ps UV solid state laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4426, Issue , 2002, Pages 416-423

  Morishige, Yukio ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Ablation; Damage; Laser; Photomask; Pico second; Quartz; Repair; Ultraviolet

Indexed keywords

LASER ABLATION; LITHOGRAPHY; LSI CIRCUITS; MASKS; MICROPROCESSOR CHIPS; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

PHOTOMASKS;

SOLID STATE LASERS;

EID: 0036385803     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.456808     Document Type: Conference Paper

References (7)

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