High resolution near field mask repair with Femto second laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 112-120

  Shani, Yosi ^a   Melnick, Ian ^a   Yoffe, Sasha ^a   Sharon, Yuval ^a   Lieberman, Klony ^a   Terkel, Hanan ^a  

^a Nanonics Lithography Ltd   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CHROMIUM COMPOUNDS; LASER ABLATION; LASER PULSES; METALLIC FILMS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; ULTRAFAST PHENOMENA;

FEMTOSECOND LASERS; NEAR FIELD MASK REPAIR;

MASKS;

EID: 0032303047     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332815     Document Type: Conference Paper

References (0)