Charge transport in low stress Si-rich silicon nitride thin films

Materials Research Society Symposium - Proceedings

Volumn 687, Issue , 2002, Pages 107-112

  Habermehl, S ^a   Carmignani, C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LEAKAGE CURRENTS; SILICON NITRIDE; STOICHIOMETRY; STRAIN; STRESSES;

CHARGE TRANSPORT; MOLECULAR LEVEL; POOLE-FRENKEL BARRIER HEIGHT; POOLE-FRENKEL EMISSION; RESIDUAL STRAIN;

THIN FILMS;

EID: 0036350299     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)