All CO2-processed fluoropolymer-containing photoresist systems

Materials Research Society Symposium - Proceedings

Volumn 705, Issue , 2002, Pages 73-79

  Flowers, Devin ^a   Hoggan, Erik ^a   DeSimone, Joseph M ^a   Carbonell, Ruben ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; FLUORINE CONTAINING POLYMERS; ORGANIC SOLVENTS; PHOTORESISTS; RESINS; SPIN COATING; ULTRATHIN FILMS; ULTRAVIOLET SPECTROSCOPY; VISCOSITY;

AQUEOUS WASTE; CARBON DIOXIDE COMPATIBLE RESIST SYSTEM; LIQUID CARBON DIOXIDE;

NANOTECHNOLOGY;

EID: 0036350233     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. Outlook for 157 nm resist design
2. Synthesis of fluoropolymers in supercritical carbon dioxide
3. 2-based processing for 193-nm and 157-nm photolithography
4. Guideline for definition and measurement of equipment reliability, availability, and maintainability (RAM)