Eluding metal contamination in CMOS front-end fabrication by nanocrystal formation process

Materials Research Society Symposium - Proceedings

Volumn 686, Issue , 2002, Pages 147-152

  Liu, Zengtao ^a   Lee, Chungho ^a   Pei, Gen ^a   Narayanan, Venkat ^a   Kan, Edwin C ^a  

^a School of Operations Research and Industrial Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONTAMINATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE; MOS CAPACITORS; MOSFET DEVICES; RAPID THERMAL ANNEALING; SILICA; THIN FILMS;

MINORITY CARRIER LIFETIME;

NANOSTRUCTURED MATERIALS;

EID: 0036346591     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)