Low temperature deposition of transparent ultra water-repellent thin films by microwave plasma enhanced chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 711, Issue , 2002, Pages 283-288

  Wu, Yunying ^a   Inoue, Yasushi ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON DIOXIDE; CONTACT ANGLE; FILM PREPARATION; HYDROPHOBICITY; LOW TEMPERATURE OPERATIONS; NITROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; TRANSPARENCY; WATER;

LOW TEMPERATURE DEPOSITION; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ORGANOSILANE; TRANSPARENT ULTRA WATER REPELLENT THIN FILMS; TRIMETHYLMETHOXYSILANE;

ULTRATHIN FILMS;

EID: 0036343415     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

1. High Resolution XPS of organic polymers the scienta ESCA300 database